Double-pass RO · EDI · UV Steriliser · Final Polishing

DI Water Systems for
Pharmaceutical & Electronics Manufacturing.

Trace ionic contamination at the ppb level creates GMP batch risk in pharmaceutical manufacturing and yield loss in semiconductor fabrication. We configure complete DI water systems — from feed pre-treatment through EDI polishing and high-purity storage — as a complete deionized water filtration system matched to your conductivity target and compliance framework.

Double-pass ROEDI ElectrodeionizationUV SteriliserMixed-bed PolishUPW Loop
Established
2016
Certifications
CE · ISO 9001 · ASME*
Factory Area
70,500 sqm
Workshop
21,000 sqm
Techs / Engineers
78 / 28
Export Markets
20+ countries

*available on request for applicable pressure vessel components

System Configuration Packages

Which of these describes your application?

Three pre-engineered DI water system configurations matched to regulatory grade and application. Identify your purity target and compliance framework — then request the full specification from our engineering team.

Scenario P-1

Pharmaceutical manufacturing — purified water (PW)

GMP facility · USP / Ph. Eur. / ChP · conductivity and TOC limits confirmed by applicable pharmacopoeia

  • Making tablets, capsules, topical products, or running sanitisation cycles in a GMP-regulated facility
  • Purified Water standard required: USP / EP / ChP — conductivity ≤ 1.3 µS/cm at 25°C
  • Regulatory inspection (FDA, EMA, NMPA) audits the water system design and validation records
What we do to your water:
Pre-treat → Double-pass RO → UV oxidation → Ion exchange polishing → Sanitary loop distribution

*Final compliance must be confirmed against the user’s process specification, validation protocol, and applicable local standard.

This matches my project

After you submit — an engineer reviews within 24–48 h. No complete water analysis required to start; send available data and we will identify what is still needed.

Scenario P-2

Injectable drug manufacturing — Water for Injection (WFI)

Injectable products · Endotoxin ≤ 0.25 EU/mL · FDA / EMA

  • Manufacturing injectable drugs, IV solutions, or biological products
  • WFI standard required: endotoxin ≤ 0.25 EU/mL, bacteria ≤ 10 CFU/100 mL
  • FDA or EMA inspection will audit the water system and demand full validation documentation
  • Membrane-based WFI requires regulatory acceptance, validated equivalence to pharmacopoeia requirements, and a documented biofilm control and monitoring strategy.
What we do to your water:
PW-grade feed system → validated WFI generation by multi-effect distillation or membrane-based process equivalent to distillation → endotoxin control → hot or ozone-sanitised distribution loop
This matches my project

After you submit — an engineer reviews within 24–48 h. No complete water analysis required to start; send available data and we will identify what is still needed.

Scenario P-3

Electronics or semiconductor fabrication

Wafer rinse · PCB · LCD · ≥ 18.2 MΩ·cm resistivity

  • Manufacturing semiconductors, LCD panels, PCBs, or precision optical components
  • Resistivity target ≥ 18.2 MΩ·cm — trace ionic contamination causes direct yield loss in fab processes
  • Particle count, dissolved silica, metals, and TOC all have specification limits below normal PW standards
What we do to your water:
Pre-treat → Double-pass RO → EDI continuous electrodeionization → UV TOC oxidation → Final polish → UPW loop

*Final compliance must be confirmed against the user’s process specification, validation protocol, and applicable local standard.

This matches my project

After you submit — an engineer reviews within 24–48 h. No complete water analysis required to start; send available data and we will identify what is still needed.

Not sure which scenario fits? Describe your application and purity requirement below — our engineers will confirm the right configuration and respond with a site-specific proposal.

DI Water System Treatment Route

From feed water to final purity — the complete DI water system treatment route.

The treatment route for pharmaceutical purified water and electronics ultra-pure water uses the same stage architecture but diverges at UV wavelength, final polishing, storage materials, and distribution loop design. Every stage has a defined output quality and a defined failure mode at the application purity level.

01Pre-treatmentMMF · ACF · softener
02Cartridge Filter5 µm · pre-RO protection
03Double-pass ROFeed to EDI ≤ 10 mg/L TDS
04EDI Electrodeionization≥ 10 MΩ·cm · continuous polishing
05UV Steriliser254 nm pharma · 185 nm electronics TOC
06Final Polishing≥ 18.2 MΩ·cm trim · non-regenerable MB
07Pure Water Storage316L SS · electropolished · Ra ≤ 0.8 µm
08Distribution LoopRecirculation · in-place sanitisation ready
StageKey Operating ParameterEngineering Consequence if Undersized / Omitted
Double-pass ROFeed TDS to EDI must remain below 10 mg/L for stable EDI output; double-pass handles seasonal source TDS variation better than single-pass.Single-pass RO at 300 mg/L source feed produces 3–6 mg/L permeate under stable conditions; seasonal source blending pushes permeate above EDI feed limit and destabilises resistivity output — the effect appears as gradual resistivity drift, not an alarm event.
EDI electrodeionizationContinuous chemical-free polishing; feed TDS must remain below 10 mg/L; post-EDI resistivity typically ≥ 10 MΩ·cm.Running EDI consistently above its feed TDS operating range accelerates capacity saturation; resistivity declines gradually over days to weeks before the alarm threshold — by which time GMP batch documentation may already be affected.
UV steriliser254 nm for microbial inactivation in pharmaceutical PW systems; 185 nm for TOC photolysis in electronics UPW where TOC target is below 10 ppb.Using 254 nm only on an electronics system with a TOC specification limit leaves the photolysis step absent; RO and EDI alone are not reliable on variable organic feed water for TOC control below 10 ppb.
Final polishing (OPT — electronics grade)Non-regenerable mixed-bed polishing cartridge downstream of EDI; required for SEMI F63 ≥ 18.2 MΩ·cm output.For pharmaceutical PW, EDI output typically meets conductivity ≤ 1.3 µS/cm without polishing. For electronics grade ≥ 18.2 MΩ·cm, the polishing trim step is required — EDI alone does not consistently achieve the resistivity ceiling.
Storage tank material316L SS with electropolished interior (Ra ≤ 0.8 µm) for pharmaceutical PW; PVDF or PFA for point-of-use sections in electronics UPW loops.316L stainless steel is the correct material for pharmaceutical purified water. In electronics loops targeting ≥ 18.2 MΩ·cm, metallic contact surfaces can leach trace ions — point-of-use resistivity can fall below specification even when the production skid measures correctly.

Our double-pass RO systems and EDI electrodeionization systems are configured to your feed water TDS, purity grade, and flow rate — not to a standard product table. EDI feed TDS, UV wavelength, storage material, and distribution loop design are all specified from your application grade and compliance framework.

Double-pass RO vs single-pass — when the second stage is required

We specify double-pass RO as the standard starting design for pharmaceutical purified water and electronics UPW because feed water TDS variability is the primary engineering reason. A 300 mg/L TDS municipal feed may produce single-pass permeate at 3–6 mg/L under stable conditions, but seasonal source blending can push permeate above 10–15 mg/L during peak variation periods. Double-pass stacks rejection across two membrane stages and keeps EDI feed reliably below 5–10 mg/L across a wider operating range than single-pass allows.

Pharmaceutical PW vs electronics UPW — where the specifications diverge

USP Purified Water targets conductivity ≤ 1.3 µS/cm at 25°C, TOC ≤ 500 ppb, and microbial count ≤ 100 CFU/mL. SEMI F63 UPW targets resistivity ≥ 18.2 MΩ·cm (conductivity ≤ 0.055 µS/cm), TOC < 1–10 ppb, dissolved silica < 0.3 ppb, and particle count < 1/mL at 0.05 µm. The difference changes UV wavelength selection, polishing stage inclusion, distribution loop material specification, and documentation scope — not just the resistivity number.

Engineering Variables

Engineering variables reference.

These variables determine whether the system configures to pharmaceutical PW or electronics UPW grade, which UV wavelength is required, and what distribution loop materials are specified.

ParameterTypical RangeEngineering ConsequenceConfiguration Approach
Application gradePharmaceutical PW: USP / Ph. Eur. / ChP — limits confirmed per applicable pharmacopoeia during design and validation review. Electronics UPW: SEMI F63 / ASTM E1196 as guide; final targets confirmed by fab node and customer specification.Determines UV wavelength, polishing stage inclusion, storage material specification, and documentation scope.Pharma: 316L SS storage, 254 nm UV, EDI + optional polish. Electronics: PVDF/PFA sections, 185 nm UV, EDI + mixed-bed polish mandatory.
Source water TDS50–500 mg/L typical municipal feedDetermines whether single-pass or double-pass RO keeps EDI feed reliably below 10 mg/L TDS.Double-pass is the default starting design; single-pass evaluated only for low-TDS sources under stable feed conditions.
EDI feed TDSTypical design target: RO permeate TDS often below 5–10 mg/L; confirmed by selected EDI module specification.Excess TDS, CO₂, silica, hardness, chlorine, or temperature variation relative to module specification can destabilise EDI resistivity output.Double-pass RO stacks rejection to keep EDI feed reliably below 5–10 mg/L across source TDS seasonal variation.
Output conductivity · pharma≤ 1.3 µS/cm at 25°C — confirmed per applicable pharmacopoeiaAbove threshold, GMP batch documentation is affected; mandatory deviation investigation triggered.Achieved by double-pass RO + EDI under stable conditions; test points at storage and distribution loop outlets.
Output resistivity · electronics≥ 18.2 MΩ·cm (SEMI F63 guide; confirmed by customer spec)Resistivity below threshold at wafer rinse point creates ionic contamination defect risk at advanced circuit nodes.Requires EDI + non-regenerable mixed-bed polishing cartridge downstream; PVDF/PFA distribution materials reviewed to prevent ion leaching.
TOC in product water≤ 500 ppb pharmaceutical; < 10 ppb electronicsTOC above limit reacts with APIs in pharma; deposits on wafer surfaces in electronics.254 nm UV for microbial control and partial TOC reduction (pharma); 185 nm UV for TOC photolysis (electronics UPW). Final wavelength selection depends on TOC target, microbial control strategy, loop material compatibility, and downstream polishing stage.
Storage tank material316L electropolished stainless steel is commonly specified for pharmaceutical PW storage where hot sanitisation and GMP material documentation are required. Electronics UPW final loop sections often use PVDF, PFA, PP, or other qualified polymers to reduce trace ion and particle contribution.316L SS correct for pharma PW; metallic surfaces in UPW loop leach trace ions, dropping point-of-use resistivity below specification.Material confirmed at design stage; Ra measurement and electropolishing documentation part of GMP material qualification.
CIP/SIP compatibilityRequired for pharmaceutical loops; hot water sanitisation at 80–121°CPharmaceutical loop must support periodic hot water or steam sanitisation to control biofilm in recirculating distribution.Storage tank, loop piping, and valve connections specified for sanitisation temperature and chemical compatibility.
EDI power supplyDC power confirmed from module specification; voltage and current at design stageInsufficient DC power causes EDI to under-perform without triggering a standard flow alarm.Electrical capacity verified during design; included in site electrical planning documentation.
Engineering · Manufacturing · Export

Engineering credentials & export capability.

Founded in 2016, Qingdao Hiju Thermal Power Co., Ltd operates from a 70,500 sqm facility with 21,000 sqm of dedicated production workshop space. Our engineering team comprises 78 technicians and 28 engineers structured to handle full project scope — from design review through factory testing to export documentation.

We hold CE, ISO 9001 and ASME-related manufacturing documentation for applicable pressure-rated components. Where project specifications require pressure-vessel documentation, ASME-compliant components can be supplied on request. CE and ISO 9001 are standard compliance documentation reviewed during supplier qualification audits and regulatory inspections in pharmaceutical manufacturing. For electronics fabrication clients, CE-marked electrical components and ISO 9001 system documentation support factory acceptance testing and equipment qualification procedures.

Our systems have been exported to clients in more than 20 countries and regions, with primary markets in Southeast Asia, the Middle East, Africa, South America and Central Asia. Review our completed engineering projects to verify project type, application and export geography without relying on marketing claims, or browse our full range of industrial water treatment plant solutions by application sector — including systems for bottled water plants and food and beverage production.

High-purity water treatment system assembly workshop — pharmaceutical GMP water room and electronics UPW system production
Project Review Inputs

Submit your water treatment requirements.

Our engineering team reviews each project against your purity grade, feed water analysis, and compliance framework before recommending a system configuration. Send the inputs below.

Block A · Water

Water & process inputs

  • Application grade — Pharmaceutical PW (USP/EP/ChP), WFI, or electronics UPW (SEMI F63 / ASTM) — specifies the output quality target.
  • Source water TDS and quality — Conductivity, TDS, hardness, chlorine, TOC if available; full laboratory analysis report preferred.
  • Required flow rate — Continuous production flow in m³/h; peak demand if batch operations create variable demand.
  • Regulatory framework — Applicable pharmacopoeia or semiconductor purity standard; inspection authority if applicable.
  • System validation requirement — DQ/IQ/OQ/PQ validation scope; FAT/SAT requirement; documentation package standard.
Block B · Site

Site & project inputs

  • Site power supply — Voltage, available amperage; EDI requires a dedicated DC power circuit.
  • Distribution loop design — Recirculation loop length; sanitisation method (hot water, steam, chemical); point-of-use count.
  • Existing infrastructure — Existing pre-treatment or storage assets that may be retained or upgraded.
  • Destination country — Country of installation; applicable local regulations or import certification requirements.
  • Project timeline — Required delivery, installation, and commissioning completion dates.
Request a requirements-based review

For rapid dialogue in Southeast Asia, the Middle East, Africa, or South America, contact our engineering team via WhatsApp or email with your purity specification and source water analysis.

For facilities that also operate boilers for clean steam generation — where steam contacts pharmaceutical product or equipment surfaces — our boiler feed water treatment solutions address the upstream feed water conditioning for that separate system. boiler feed water treatment

For community water infrastructure and municipal drinking water systems where the output specification is WHO-compliant drinking water rather than pharmaceutical or electronics-grade purity, our municipal and community drinking water solutions cover that design pathway. water filtration system for drinking

Product Hubs

Explore by product category

Every piece of equipment used in the configurations above belongs to one of these six product families. Browse the full range, specifications, and configuration options.

Buyer Questions

Frequently asked questions.

Q.01Why is double-pass RO the standard starting design rather than single-pass?+
Feed water TDS variability is the primary reason. A 300 mg/L municipal source produces single-pass permeate at 3–6 mg/L under stable conditions, but seasonal blending can push permeate above 10–15 mg/L. Double-pass RO keeps EDI feed reliably below 5–10 mg/L across a wider source TDS range — all evaluated per project for your specific DI water system configuration.
Q.02Does EDI completely replace mixed-bed ion exchange?+
For most pharmaceutical purified water applications and electronics systems targeting 15–18.2 MΩ·cm, EDI replaces regenerable mixed-bed ion exchange as the continuous production step — eliminating acid and caustic regeneration downtime. However, SEMI F63 electronics-grade output at ≥ 18.2 MΩ·cm usually still requires a non-regenerable mixed-bed polishing cartridge downstream of EDI as a final resistivity trim step.
Q.03What UV wavelength does a pharmaceutical purified water system require?+
For pharmaceutical PW, 254 nm UV for microbial inactivation is the standard. For electronics with TOC below 10 ppb, 185 nm for TOC photolysis is reviewed — oxidising dissolved organics into ionisable fragments for downstream polishing to remove. Pharmaceutical systems with strict TOC targets may also use 185/254 nm combined UV; final wavelength selection is confirmed from TOC target and system design.
Q.04How does feed water TDS affect EDI performance?+
EDI modules are rated for a feed TDS operating range. Consistently exceeding that range accelerates capacity saturation faster than self-regeneration can offset. The symptom is gradual resistivity decline over days to weeks before the alarm threshold is crossed — this is why a complete deionization water system design starts from source water TDS variability, not a single threshold.
Q.05Is 316L stainless steel the correct material for all DI water storage?+
316L stainless steel with electropolished interior at Ra ≤ 0.8 µm is the standard material for pharmaceutical purified water storage — it supports hot-loop sanitisation and qualification records. For electronics UPW at ≥ 18.2 MΩ·cm, PVDF, PFA, PE, or polypropylene are reviewed in final-polishing and point-of-use sections to avoid trace ion leaching from metallic contact surfaces.
Q.06What differs between USP Purified Water and SEMI F63 ultra-pure water on the same train?+
The train architecture is similar but design variables differ. USP PW targets conductivity ≤ 1.3 µS/cm, TOC ≤ 500 ppb, and microbial control. SEMI F63 targets ≥ 18.2 MΩ·cm, TOC below 1–10 ppb, and silica below 0.3 ppb — changing UV wavelength, polishing, and loop material specification. SEMI F63 is a guide; actual UPW targets are confirmed by fab node and customer spec.
Q.07Can your systems be supplied with OEM branding and documentation?+
Yes. OEM and ODM configurations are available across DI water systems, RO membrane systems, EDI systems, UV sterilisers, and pure water storage tanks. CE, ISO 9001, and ASME certifications are available for documentation submission to procurement teams and end clients in Southeast Asia, the Middle East, Africa, and South America.